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Growth of a Ge/Si/Ge(100) heterostructure by very low pressure chemical vapour deposition using Si~2H~6 and GeH~4 gases-photoemission and low energy electron diffraction studies
Growth of a Ge/Si/Ge(100) heterostructure by very low pressure chemical vapour deposition using Si~2H~6 and GeH~4 gases-photoemission and low energy electron diffraction studies
Growth of a Ge/Si/Ge(100) heterostructure by very low pressure chemical vapour deposition using Si~2H~6 and GeH~4 gases-photoemission and low energy electron diffraction studies
Ringeisen, F. (Autor:in) / Steinmetz, D. (Autor:in) / Van, S. (Autor:in) / Bolmont, D. (Autor:in) / Fornari, R.
01.01.1994
14 pages
Aufsatz (Zeitschrift)
Unbekannt
DDC:
620.11
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