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Composition dependence of morphology, structure, and thermoelectric properties of FeSi~2 films prepared by sputtering deposition
Composition dependence of morphology, structure, and thermoelectric properties of FeSi~2 films prepared by sputtering deposition
Composition dependence of morphology, structure, and thermoelectric properties of FeSi~2 films prepared by sputtering deposition
Tsunoda, T. (Autor:in) / Mukaida, M. (Autor:in) / Watanabe, A. (Autor:in) / Imai, Y. (Autor:in)
JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 11 ; 2062-2070
01.01.1996
9 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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