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Deposition process and property of silica films containing organic groups from aqueous solution of alkoxides
Deposition process and property of silica films containing organic groups from aqueous solution of alkoxides
Deposition process and property of silica films containing organic groups from aqueous solution of alkoxides
Oh, J. (Autor:in) / Imai, H. (Autor:in) / Hirashima, H. (Autor:in) / Tsukuma, K. (Autor:in)
JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 12 ; 1008-1016
01.01.1997
9 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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