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Laser-induced metal-organic chemical vapor deposition (MOCVD) of Cu(hfac)(TMVS) on amorphous Teflon AF1600: an XPS study of the interface
Laser-induced metal-organic chemical vapor deposition (MOCVD) of Cu(hfac)(TMVS) on amorphous Teflon AF1600: an XPS study of the interface
Laser-induced metal-organic chemical vapor deposition (MOCVD) of Cu(hfac)(TMVS) on amorphous Teflon AF1600: an XPS study of the interface
Popovici, D. (Autor:in) / Czeremuzkin, G. (Autor:in) / Meunier, M. (Autor:in) / Sacher, E. (Autor:in)
APPLIED SURFACE SCIENCE ; 126 ; 198-204
01.01.1998
7 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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