Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
TEM study of the interface between HIPed silicon nitride and encapsulation borosilicate glass
TEM study of the interface between HIPed silicon nitride and encapsulation borosilicate glass
TEM study of the interface between HIPed silicon nitride and encapsulation borosilicate glass
Westman, A.-K. (Autor:in) / Wei, L.-Y. (Autor:in)
JOURNAL OF MATERIALS SCIENCE ; 35 ; 2847-2854
01.01.2000
8 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Residual stress field of HIPed silicon nitride rolling elements
Tema Archiv | 2002
|Tensile Creep and Creep Rupture Behavior of HIPed Silicon Nitride
British Library Online Contents | 1994
|Stress and strain relaxation behaviour in HIPed silicon nitrides
British Library Online Contents | 1994
|The effects of residual phase on the 1370 C creep performance of yttria-doped HIPed silicon nitride
British Library Online Contents | 1998
|