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Improvement of oxide thickness determination on MOS structures using capacitance-voltage measurements at high frequencies
Improvement of oxide thickness determination on MOS structures using capacitance-voltage measurements at high frequencies
Improvement of oxide thickness determination on MOS structures using capacitance-voltage measurements at high frequencies
Soliman, L. (Autor:in) / Duval, E. (Autor:in) / Benzohra, M. (Autor:in) / Lheurette, E. (Autor:in) / Ketata, K. (Autor:in) / Ketata, M. (Autor:in)
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 4 ; 163-166
01.01.2001
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.38152
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