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Characteristics of indium tin oxide films deposited by bias magnetron sputtering
Characteristics of indium tin oxide films deposited by bias magnetron sputtering
Characteristics of indium tin oxide films deposited by bias magnetron sputtering
Sujatha, C. ( Autor:in ) / Rao, G. M. ( Autor:in ) / Uthanna, S. ( Autor:in )
MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 94 ; 106 - 110
01.01.2002
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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