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Rapid preparation of indium tin oxide sputtering targets by spark plasma sintering
Rapid preparation of indium tin oxide sputtering targets by spark plasma sintering
Rapid preparation of indium tin oxide sputtering targets by spark plasma sintering
Takeuchi, T. (Autor:in) / Ishida, T. (Autor:in) / Ichikawa, K. (Autor:in) / Miyamoto, S. (Autor:in) / Kawahara, M. (Autor:in) / Kageyama, H. (Autor:in)
JOURNAL OF MATERIALS SCIENCE LETTERS ; 21 ; 855-857
01.01.2002
3 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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