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Copper Wires for High Speed Logic LSI Prepared by Low Pressure Long Throw Sputtering Method
Copper Wires for High Speed Logic LSI Prepared by Low Pressure Long Throw Sputtering Method
Copper Wires for High Speed Logic LSI Prepared by Low Pressure Long Throw Sputtering Method
Saito, T. (Autor:in) / Hashimoto, T. (Autor:in) / Ohashi, N. (Autor:in) / Fujiwara, T. (Autor:in) / Yamaguchi, H. (Autor:in)
MATERIALS TRANSACTIONS ; 43 ; 1599-1604
01.01.2002
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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ITO Films Prepared by Long-throw Magnetron Sputtering without Oxygen Partial Pressure
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