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Preferred orientations of NiO thin films prepared by RF magnetron sputtering
Preferred orientations of NiO thin films prepared by RF magnetron sputtering
Preferred orientations of NiO thin films prepared by RF magnetron sputtering
Ryu, H. W. (Autor:in) / Choi, G. P. (Autor:in) / Lee, W. S. (Autor:in) / Park, J. S. (Autor:in)
JOURNAL OF MATERIALS SCIENCE ; 39 ; 4375-4377
01.01.2004
3 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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