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Low roughness laser etching of fused silica using an adsorbed layer
Low roughness laser etching of fused silica using an adsorbed layer
Low roughness laser etching of fused silica using an adsorbed layer
Bohme, R. (Autor:in) / Zimmer, K. (Autor:in)
APPLIED SURFACE SCIENCE ; 239 ; 109-116
01.01.2004
8 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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