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Fluorine-free and fluorine containing MOCVD precursors for electronic oxides: a comparison
Fluorine-free and fluorine containing MOCVD precursors for electronic oxides: a comparison
Fluorine-free and fluorine containing MOCVD precursors for electronic oxides: a comparison
Bedoya, C. (Autor:in) / Condorelli, G. G. (Autor:in) / Di Mauro, A. (Autor:in) / Anastasi, G. (Autor:in) / Fragala, I. L. (Autor:in) / Lisoni, J. G. (Autor:in) / Wouters, D. (Autor:in)
MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 118 ; 264-269
01.01.2005
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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