Initial oxidation kinetics of Cu(100), (110), and (111) thin films investigated by in situ ultra-high-vacuum transmission electron microscopy: Fid-Bau Portal

Initial oxidation kinetics of Cu(100), (110), and (111) thin films investigated by in situ ultra-high-vacuum transmission electron microscopy

Zhou, G. / Yang, J. C.

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Initial oxidation kinetics of Cu(100), (110), and (111) thin films investigated by in situ ultra-high-vacuum transmission electron microscopy

Zhou, G. / Yang, J. C.

Initial oxidation kinetics of Cu(100), (110), and (111) thin films investigated by in situ ultra-high-vacuum transmission electron microscopy

Zhou, G. / Yang, J. C.

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Zugriff über TIB

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Titel:

Initial oxidation kinetics of Cu(100), (110), and (111) thin films investigated by in situ ultra-high-vacuum transmission electron microscopy

Beteiligte:

Zhou, G. (Autor:in) / Yang, J. C. (Autor:in)

Erschienen in:

JOURNAL OF MATERIALS RESEARCH -PITTSBURGH THEN WARRENDALE- ; 20 ; 1684-1694

Erscheinungsdatum:

01.01.2005

Format / Umfang:

11 pages

ISSN:

0884-2914

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 620.11

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