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Heteroepitaxial Growth and Characterization of 3C-SiC Films on Si Substrates Using LPVCVD
Heteroepitaxial Growth and Characterization of 3C-SiC Films on Si Substrates Using LPVCVD
Heteroepitaxial Growth and Characterization of 3C-SiC Films on Si Substrates Using LPVCVD
JOURNAL OF MATERIALS SCIENCE AND TECHNOLOGY -SHENYANG- ; 21 ; 536-540
01.01.2005
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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