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Titanium oxide thin film deposited on metallic Cr substrate by RF-magnetron sputtering
Titanium oxide thin film deposited on metallic Cr substrate by RF-magnetron sputtering
Titanium oxide thin film deposited on metallic Cr substrate by RF-magnetron sputtering
Lee, S. H. (Autor:in) / Lee, K. S. (Autor:in) / Kim, J. H. (Autor:in)
MATERIALS LETTERS ; 61 ; 3440-3442
01.01.2007
3 pages
Aufsatz (Zeitschrift)
Englisch
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