Extremely-high-intensity photoluminescence from CuBr films fabricated by film–substrate chemical reaction of CuCl films on KBr-crystal substrate: Fid-Bau Portal

Extremely-high-intensity photoluminescence from CuBr films fabricated by film–substrate chemical reaction of CuCl films on KBr-crystal substrate

Kondo, S. / Hata, Y. / Saito, T.

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Extremely-high-intensity photoluminescence from CuBr films fabricated by film–substrate chemical reaction of CuCl films on KBr-crystal substrate

Kondo, S. / Hata, Y. / Saito, T.

Extremely-high-intensity photoluminescence from CuBr films fabricated by film–substrate chemical reaction of CuCl films on KBr-crystal substrate

Kondo, S. / Hata, Y. / Saito, T.

Zugriff

Zugriff über TIB

Verfügbarkeit in meiner Bibliothek prüfen

Bestellung bei Subito €

Seitennavigation

Dokumentinformationen

Ähnliche Titel

Exportieren, teilen und zitieren

Dokumentinformationen

Titel:

Extremely-high-intensity photoluminescence from CuBr films fabricated by film–substrate chemical reaction of CuCl films on KBr-crystal substrate

Beteiligte:

Kondo, S. (Autor:in) / Hata, Y. (Autor:in) / Saito, T. (Autor:in)

Erschienen in:

MATERIALS LETTERS ; 62 ; 33-36

Erscheinungsdatum:

01.01.2008

Format / Umfang:

4 pages

ISSN:

0167-577X

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 620.1105 / 530

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