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Performance of Low Resistivity Electrode Prepared by Electroless Plated for Amorphous Silicon Thin-Film Transistors

Tsay, C.Y. / Lin, C.K. / Lin, H.M. / Chang, S.C. / Chung, B.C.

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Performance of Low Resistivity Electrode Prepared by Electroless Plated for Amorphous Silicon Thin-Film Transistors

Tsay, C.Y. / Lin, C.K. / Lin, H.M. / Chang, S.C. / Chung, B.C.

Performance of Low Resistivity Electrode Prepared by Electroless Plated for Amorphous Silicon Thin-Film Transistors

Tsay, C.Y. / Lin, C.K. / Lin, H.M. / Chang, S.C. / Chung, B.C.

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Titel:

Performance of Low Resistivity Electrode Prepared by Electroless Plated for Amorphous Silicon Thin-Film Transistors

Beteiligte:

Tsay, C.Y. (Autor:in) / Lin, C.K. (Autor:in) / Lin, H.M. (Autor:in) / Chang, S.C. (Autor:in) / Chung, B.C. (Autor:in) / Chang, Y.W. / Kim, N.J. / Lee, C.S.

Erschienen in:

PRICM 6: Selected, peer reviewed papers from The Sixth Pacific Rim International Conference on Advanced Materials and Processing, November 5-9, 2007, ICC Jeju, Jeju Island, Korea ; 1165-1168

MATERIALS SCIENCE FORUM ; 561/565

Erscheinungsdatum:

01.01.2007

Format / Umfang:

4 pages

ISSN:

0255-5476

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 620.11

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