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Functional polymers by two-photon 3D lithography
Functional polymers by two-photon 3D lithography
Functional polymers by two-photon 3D lithography
Infuehr, R. (Autor:in) / Pucher, N. (Autor:in) / Heller, C. (Autor:in) / Lichtenegger, H. (Autor:in) / Liska, R. (Autor:in) / Schmidt, V. (Autor:in) / Kuna, L. (Autor:in) / Haase, A. (Autor:in) / Stampfl, J. (Autor:in)
APPLIED SURFACE SCIENCE ; 254 ; 836-840
01.01.2007
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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