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Quantification of trace amounts of impurities in high purity cobalt by high resolution inductively coupled plasma mass spectrometry

Xie, H. / Huang, K. / Nie, X. / Tang, Y.

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Quantification of trace amounts of impurities in high purity cobalt by high resolution inductively coupled plasma mass spectrometry

Xie, H. / Huang, K. / Nie, X. / Tang, Y.

Quantification of trace amounts of impurities in high purity cobalt by high resolution inductively coupled plasma mass spectrometry

Xie, H. / Huang, K. / Nie, X. / Tang, Y.

Zugriff

Zugriff über TIB

Verfügbarkeit in meiner Bibliothek prüfen

Bestellung bei Subito €

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Dokumentinformationen

Ähnliche Titel

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Dokumentinformationen

Titel:

Quantification of trace amounts of impurities in high purity cobalt by high resolution inductively coupled plasma mass spectrometry

Beteiligte:

Xie, H. (Autor:in) / Huang, K. (Autor:in) / Nie, X. (Autor:in) / Tang, Y. (Autor:in)

Erschienen in:

RARE METALS -BEIJING- ENGLISH EDITION ; 26 ; 286-291

Erscheinungsdatum:

01.01.2007

Format / Umfang:

6 pages

ISSN:

1001-0521

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 669

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