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Preparation and characterization of a novel Si-incorporated ceramic film on pure titanium by plasma electrolytic oxidation

Zhang, W. / Du, K. / Yan, C. / Wang, F.

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Preparation and characterization of a novel Si-incorporated ceramic film on pure titanium by plasma electrolytic oxidation

Zhang, W. / Du, K. / Yan, C. / Wang, F.

Preparation and characterization of a novel Si-incorporated ceramic film on pure titanium by plasma electrolytic oxidation

Zhang, W. / Du, K. / Yan, C. / Wang, F.

Zugriff

Zugriff über TIB

Verfügbarkeit in meiner Bibliothek prüfen

Bestellung bei Subito €

Seitennavigation

Dokumentinformationen

Ähnliche Titel

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Dokumentinformationen

Titel:

Preparation and characterization of a novel Si-incorporated ceramic film on pure titanium by plasma electrolytic oxidation

Beteiligte:

Zhang, W. (Autor:in) / Du, K. (Autor:in) / Yan, C. (Autor:in) / Wang, F. (Autor:in)

Erschienen in:

APPLIED SURFACE SCIENCE ; 254 ; 5216-5223

Erscheinungsdatum:

01.01.2008

Format / Umfang:

8 pages

ISSN:

0169-4332

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 621.35

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