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In situ functionalized self-assembled monolayer surfaces for selective chemical vapor deposition of copper
In situ functionalized self-assembled monolayer surfaces for selective chemical vapor deposition of copper
In situ functionalized self-assembled monolayer surfaces for selective chemical vapor deposition of copper
Liu, X. (Autor:in) / Wang, Q. (Autor:in) / Chen, L. P. (Autor:in)
APPLIED SURFACE SCIENCE ; 255 ; 3789-3794
01.01.2009
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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