Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
One-Step Direct-Patterning Template Utilizing Self-Assembly of POSS-Containing Block Copolymers
One-Step Direct-Patterning Template Utilizing Self-Assembly of POSS-Containing Block Copolymers
One-Step Direct-Patterning Template Utilizing Self-Assembly of POSS-Containing Block Copolymers
Hirai, T. (Autor:in) / Leolukman, M. (Autor:in) / Liu, C. C. (Autor:in) / Han, E. (Autor:in) / Kim, Y. J. (Autor:in) / Ishida, Y. (Autor:in) / Hayakawa, T. (Autor:in) / Kakimoto, M. a. (Autor:in) / Nealey, P. F. (Autor:in) / Gopalan, P. (Autor:in)
ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 21 ; 4334-4338
01.01.2009
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Nanoscale patterning with block copolymers
British Library Online Contents | 2006
|Block copolymers enable nanoscale patterning of metal oxides
British Library Online Contents | 2015
|Self-assembly of rod-coil block copolymers
British Library Online Contents | 2008
|Self-Assembly of Block Copolymers on Flexible Substrates
British Library Online Contents | 2010
|Nanostructured Thin Films via Self-Assembly of Block Copolymers
British Library Online Contents | 2002
|