Effects of UV Irradiation on Microstructure and Properties of HfO~2 Films Prepared from Alkoxy-Derived Precursor Solution: Fid-Bau Portal

Effects of UV Irradiation on Microstructure and Properties of HfO~2 Films Prepared from Alkoxy-Derived Precursor Solution

Suzuki, K. / Kato, K.

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Effects of UV Irradiation on Microstructure and Properties of HfO~2 Films Prepared from Alkoxy-Derived Precursor Solution

Suzuki, K. / Kato, K.

Effects of UV Irradiation on Microstructure and Properties of HfO~2 Films Prepared from Alkoxy-Derived Precursor Solution

Suzuki, K. / Kato, K.

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Titel:

Effects of UV Irradiation on Microstructure and Properties of HfO~2 Films Prepared from Alkoxy-Derived Precursor Solution

Beteiligte:

Suzuki, K. (Autor:in) / Kato, K. (Autor:in) / Takenaka, T. / Haneda, H. / Kato, K. / Takata, M. / Shinozaki, K.

Erschienen in:

Asian Ceramic Science for Electronics III and Electroceramics in Japan XII Proceedings of the 6th Asian Meeting on Electroceramics and the 28th Electronics Division Meeting of the Ceramic Society of Japan, Tsukuba, Japan, October 22-24, 2008 ; 91-94

KEY ENGINEERING MATERIALS ; 421/422

Erscheinungsdatum:

01.01.2010

Format / Umfang:

4 pages

ISSN:

1013-9826

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 620.11

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