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Anisotropic Ostwald Ripening in Silicon Nitride: On the Reaction-Controlled Kinetics
Anisotropic Ostwald Ripening in Silicon Nitride: On the Reaction-Controlled Kinetics
Anisotropic Ostwald Ripening in Silicon Nitride: On the Reaction-Controlled Kinetics
Kitayama, M. (Autor:in) / Chandra, T. / Wanderka, N. / Reimers, W. / Ionescu, M.
01.01.2010
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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