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Study on wetting properties of periodical nanopatterns by a combinative technique of photolithography and laser interference lithography
Study on wetting properties of periodical nanopatterns by a combinative technique of photolithography and laser interference lithography
Study on wetting properties of periodical nanopatterns by a combinative technique of photolithography and laser interference lithography
Yang, Y. L. (Autor:in) / Hsu, C. C. (Autor:in) / Chang, T. L. (Autor:in) / Kuo, L. S. (Autor:in) / Chen, P. H. (Autor:in)
APPLIED SURFACE SCIENCE ; 256 ; 3683-3687
01.01.2010
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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