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Role of Gallium Doping in Dramatically Lowering Amorphous-Oxide Processing Temperatures for Solution-Derived Indium Zinc Oxide Thin-Film Transistors
Role of Gallium Doping in Dramatically Lowering Amorphous-Oxide Processing Temperatures for Solution-Derived Indium Zinc Oxide Thin-Film Transistors
Role of Gallium Doping in Dramatically Lowering Amorphous-Oxide Processing Temperatures for Solution-Derived Indium Zinc Oxide Thin-Film Transistors
Jeong, S. (Autor:in) / Ha, Y. G. (Autor:in) / Moon, J. (Autor:in) / Facchetti, A. (Autor:in) / Marks, T. J. (Autor:in)
ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 22 ; 1346-1350
01.01.2010
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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