High temperature coefficients of resistance of VO2 films grown by excimer-laser-assisted metal organic deposition process for bolometer application: Fid-Bau Portal

High temperature coefficients of resistance of VO2 films grown by excimer-laser-assisted metal organic deposition process for bolometer application

Nishikawa, M. / Nakajima, T. / Manabe, T. / Okutani, T. / Tsuchiya, T.

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High temperature coefficients of resistance of VO2 films grown by excimer-laser-assisted metal organic deposition process for bolometer application

Nishikawa, M. / Nakajima, T. / Manabe, T. / Okutani, T. / Tsuchiya, T.

High temperature coefficients of resistance of VO2 films grown by excimer-laser-assisted metal organic deposition process for bolometer application

Nishikawa, M. / Nakajima, T. / Manabe, T. / Okutani, T. / Tsuchiya, T.

Zugriff

Zugriff über TIB

Verfügbarkeit in meiner Bibliothek prüfen

Bestellung bei Subito €

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Ähnliche Titel

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Titel:

High temperature coefficients of resistance of VO2 films grown by excimer-laser-assisted metal organic deposition process for bolometer application

Beteiligte:

Nishikawa, M. (Autor:in) / Nakajima, T. (Autor:in) / Manabe, T. (Autor:in) / Okutani, T. (Autor:in) / Tsuchiya, T. (Autor:in)

Erschienen in:

MATERIALS LETTERS ; 64 ; 1921-1924

Erscheinungsdatum:

01.01.2010

Format / Umfang:

4 pages

ISSN:

0167-577X

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 620.1105 / 530

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Daoudi, K. / Tsuchiya, T. / Nakajima, T. et al. | British Library Online Contents | 2007

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