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Advanced Lapping and Polishing Methods for Planarizing a Single-Crystal 4H-Sic Utilizing Fe Abrasive Particles
Advanced Lapping and Polishing Methods for Planarizing a Single-Crystal 4H-Sic Utilizing Fe Abrasive Particles
Advanced Lapping and Polishing Methods for Planarizing a Single-Crystal 4H-Sic Utilizing Fe Abrasive Particles
Kubota, A. (Autor:in) / Yoshimura, M. (Autor:in) / Watayo, T. (Autor:in) / Nakanishi, Y. (Autor:in) / Touge, M. (Autor:in) / Zhao, J. / Kunieda, M. / Yang, G. / Yuan, X.-M.
01.01.2010
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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