Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Process Optimization for Electroless Nickel Plating of Single Crystal Silicon Based on Self-Assembly Monolayer
Process Optimization for Electroless Nickel Plating of Single Crystal Silicon Based on Self-Assembly Monolayer
Process Optimization for Electroless Nickel Plating of Single Crystal Silicon Based on Self-Assembly Monolayer
Hu, R. (Autor:in) / Xiong, X.-l. (Autor:in) / Wang, G.-q. (Autor:in) / Wei, H.-y. (Autor:in) / Zhang, H.-m. (Autor:in) / Yang, Y.-q. (Autor:in)
MATERIALS PROTECTION -WUHAN- ; 43 ; 32-34
01.01.2010
3 pages
Aufsatz (Zeitschrift)
Unbekannt
DDC:
620.1
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Electroless Nickel Plating Process for Single Crystal Silicon Involving Silver Nitrate Activation
British Library Online Contents | 2013
|Palladium - Free Activation Process for Electroless Nickel Plating on Silicon Substrate
British Library Online Contents | 2011
|Influence of Hydrogen on Electroless Nickel Plating Process
British Library Online Contents | 2006
|Optimization of Electroless Nickel Plating Process for Mica Powder as Conductive Filler
British Library Online Contents | 2014
|New Brightener for Electroless Nickel Plating
British Library Online Contents | 2002
|