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Fabrication of n and p Type Organic Thin Film Transistors with Minimized Gate Overlaps by Self Aligned Nanoimprinting
Fabrication of n and p Type Organic Thin Film Transistors with Minimized Gate Overlaps by Self Aligned Nanoimprinting
Fabrication of n and p Type Organic Thin Film Transistors with Minimized Gate Overlaps by Self Aligned Nanoimprinting
Palfinger, U. (Autor:in) / Auner, C. (Autor:in) / Gold, H. (Autor:in) / Haase, A. (Autor:in) / Kraxner, J. (Autor:in) / Haber, T. (Autor:in) / Sezen, M. (Autor:in) / Grogger, W. (Autor:in) / Domann, G. (Autor:in) / Jakopic, G. (Autor:in)
ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 22 ; 5115-5119
01.01.2010
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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