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Conformable Solid-Index Phase Masks Composed of High-Aspect-Ratio Micropillar Arrays and Their Application to 3D Nanopatterning
Conformable Solid-Index Phase Masks Composed of High-Aspect-Ratio Micropillar Arrays and Their Application to 3D Nanopatterning
Conformable Solid-Index Phase Masks Composed of High-Aspect-Ratio Micropillar Arrays and Their Application to 3D Nanopatterning
Park, J. (Autor:in) / Park, J. H. (Autor:in) / Kim, E. (Autor:in) / Ahn, C. W. (Autor:in) / Jang, H. I. (Autor:in) / Rogers, J. A. (Autor:in) / Jeon, S. (Autor:in)
ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 23 ; 860-864
01.01.2011
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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