Study of effect annealing temperature on the structure, morphology and photocatalytic activity of Si doped TiO2 thin films deposited by electron beam evaporation: Fid-Bau Portal

Study of effect annealing temperature on the structure, morphology and photocatalytic activity of Si doped TiO2 thin films deposited by electron beam evaporation

Lu, Z. / Jiang, X. / Zhou, B. / Wu, X. / Lu, L.

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Study of effect annealing temperature on the structure, morphology and photocatalytic activity of Si doped TiO2 thin films deposited by electron beam evaporation

Lu, Z. / Jiang, X. / Zhou, B. / Wu, X. / Lu, L.

Study of effect annealing temperature on the structure, morphology and photocatalytic activity of Si doped TiO2 thin films deposited by electron beam evaporation

Lu, Z. / Jiang, X. / Zhou, B. / Wu, X. / Lu, L.

Zugriff

Zugriff über TIB

Verfügbarkeit in meiner Bibliothek prüfen

Bestellung bei Subito €

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Titel:

Study of effect annealing temperature on the structure, morphology and photocatalytic activity of Si doped TiO2 thin films deposited by electron beam evaporation

Beteiligte:

Lu, Z. (Autor:in) / Jiang, X. (Autor:in) / Zhou, B. (Autor:in) / Wu, X. (Autor:in) / Lu, L. (Autor:in)

Erschienen in:

APPLIED SURFACE SCIENCE ; 257 ; 10715-10720

Erscheinungsdatum:

01.01.2011

Format / Umfang:

6 pages

ISSN:

0169-4332

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 621.35

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