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Ultra Smooth Polishing Research Based on the Cluster Magnetorheological Effect
Ultra Smooth Polishing Research Based on the Cluster Magnetorheological Effect
Ultra Smooth Polishing Research Based on the Cluster Magnetorheological Effect
Wu, Z.C. (Autor:in) / Yan, Q.S. (Autor:in) / Bai, Z.W. (Autor:in) / Kong, L.Y. (Autor:in) / Chai, J.F. (Autor:in)
KEY ENGINEERING MATERIALS ; 487 ; 283-288
01.01.2011
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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