Preparation of Perovskite-Type Oxide Thick-Film Device by EPD Method and its Application for Electrochemical Hydrogen-Phosphate Ion Sensor: Fid-Bau Portal

Preparation of Perovskite-Type Oxide Thick-Film Device by EPD Method and its Application for Electrochemical Hydrogen-Phosphate Ion Sensor

Inagaki, T. / Matsumoto, T. / Takase, S. / Shimizu, Y.

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Preparation of Perovskite-Type Oxide Thick-Film Device by EPD Method and its Application for Electrochemical Hydrogen-Phosphate Ion Sensor

Inagaki, T. / Matsumoto, T. / Takase, S. / Shimizu, Y.

Preparation of Perovskite-Type Oxide Thick-Film Device by EPD Method and its Application for Electrochemical Hydrogen-Phosphate Ion Sensor

Inagaki, T. / Matsumoto, T. / Takase, S. / Shimizu, Y.

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Titel:

Preparation of Perovskite-Type Oxide Thick-Film Device by EPD Method and its Application for Electrochemical Hydrogen-Phosphate Ion Sensor

Beteiligte:

Inagaki, T. (Autor:in) / Matsumoto, T. (Autor:in) / Takase, S. (Autor:in) / Shimizu, Y. (Autor:in) / Boccaccini, A.R. / Van der Biest, O. / Clasen, R. / Dickerson, J.H.

Erschienen in:

Electrophoretic Deposition: Fundamentals and Applications IV Selected, peer reviewed papers from the 4th International Conference on Electrophoretic Deposition: Fundamentals and Applications, October 2-7, 2011, Puerto Vallarta, Mexico ; 215-220

KEY ENGINEERING MATERIALS ; 507

Erscheinungsdatum:

01.01.2012

Format / Umfang:

6 pages

ISSN:

1013-9826

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 620.11

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