Effect of Annealing Treatment on Electrical and Optical Properties of ATO Thin Films by Pulsed Laser Deposition: Fid-Bau Portal

Effect of Annealing Treatment on Electrical and Optical Properties of ATO Thin Films by Pulsed Laser Deposition

Chen, F. / Li, N. / Shen, Q. / Wang, C.B. / Zhang, L.M.

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Effect of Annealing Treatment on Electrical and Optical Properties of ATO Thin Films by Pulsed Laser Deposition

Chen, F. / Li, N. / Shen, Q. / Wang, C.B. / Zhang, L.M.

Effect of Annealing Treatment on Electrical and Optical Properties of ATO Thin Films by Pulsed Laser Deposition

Chen, F. / Li, N. / Shen, Q. / Wang, C.B. / Zhang, L.M.

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Titel:

Effect of Annealing Treatment on Electrical and Optical Properties of ATO Thin Films by Pulsed Laser Deposition

Beteiligte:

Chen, F. (Autor:in) / Li, N. (Autor:in) / Shen, Q. (Autor:in) / Wang, C.B. (Autor:in) / Zhang, L.M. (Autor:in) / Zhang, H.

Erschienen in:

Materials for Energy Conversion and Storage ; 236-239

KEY ENGINEERING MATERIALS ; 519

Erscheinungsdatum:

01.01.2012

Format / Umfang:

4 pages

ISSN:

1013-9826

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 620.11

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