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Vertically Oriented, Three-Dimensionally Tapered Deep-Subwavelength Metallic Nanohole Arrays Developed by Photofluidization Lithography
Vertically Oriented, Three-Dimensionally Tapered Deep-Subwavelength Metallic Nanohole Arrays Developed by Photofluidization Lithography
Vertically Oriented, Three-Dimensionally Tapered Deep-Subwavelength Metallic Nanohole Arrays Developed by Photofluidization Lithography
Lee, S. A. (Autor:in) / Kang, H. S. (Autor:in) / Park, J. K. (Autor:in) / Lee, S. (Autor:in)
ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 26 ; 7521-7528
01.01.2014
8 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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