The mechanism and process of nanosecond pulsed-laser induced subwavelength periodic ripples on silica films: Fid-Bau Portal

The mechanism and process of nanosecond pulsed-laser induced subwavelength periodic ripples on silica films

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The mechanism and process of nanosecond pulsed-laser induced subwavelength periodic ripples on silica films

Zugriff

Seitennavigation

Exportieren, teilen und zitieren

Dokumentinformationen

Titel:

The mechanism and process of nanosecond pulsed-laser induced subwavelength periodic ripples on silica films

Erschienen in:

APPLIED SURFACE SCIENCE ; 337 ; 151-157

Erscheinungsdatum:

01.01.2015

Format / Umfang:

7 pages

ISSN:

0169-4332

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 621.35

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