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Hollow organosilica nanospheres prepared through surface hydrophobic layer protected selective etching
Hollow organosilica nanospheres prepared through surface hydrophobic layer protected selective etching
Hollow organosilica nanospheres prepared through surface hydrophobic layer protected selective etching
Li, J. (Autor:in) / Chen, L. X. (Autor:in) / Li, X. (Autor:in) / Zhang, C. C. (Autor:in) / Zeng, F. L. (Autor:in)
APPLIED SURFACE SCIENCE ; 340 ; 126-131
01.01.2015
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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