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Photocatalytic property of titanium dioxide thin films deposited by radio frequency magnetron sputtering in argon and water vapour plasma
Photocatalytic property of titanium dioxide thin films deposited by radio frequency magnetron sputtering in argon and water vapour plasma
Photocatalytic property of titanium dioxide thin films deposited by radio frequency magnetron sputtering in argon and water vapour plasma
Sirghi, L. (Autor:in) / Hatanaka, Y. (Autor:in) / Sakaguchi, K. (Autor:in)
APPLIED SURFACE SCIENCE ; 352 ; 38-41
01.01.2015
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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