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Energy-separated sequential irradiation for ripple pattern tailoring on silicon surfaces
Energy-separated sequential irradiation for ripple pattern tailoring on silicon surfaces
Energy-separated sequential irradiation for ripple pattern tailoring on silicon surfaces
Kumar, T. (Autor:in) / Kumar, M. (Autor:in) / Panchal, V. (Autor:in) / Sahoo, P. K. (Autor:in) / Kanjilal, D. (Autor:in)
APPLIED SURFACE SCIENCE ; 357 ; 184-188
01.01.2015
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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