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Strain in epitaxial high-index Bi2Se3(221) films grown by molecular-beam epitaxy
Strain in epitaxial high-index Bi2Se3(221) films grown by molecular-beam epitaxy
Strain in epitaxial high-index Bi2Se3(221) films grown by molecular-beam epitaxy
Li, Bin (Autor:in) / Chen, Weiguang (Autor:in) / Guo, Xin (Autor:in) / Ho, Wingkin (Autor:in) / Dai, Xianqi (Autor:in) / Jia, Jinfeng (Autor:in) / Xie, Maohai (Autor:in)
Applied surface science ; 396 ; 1825-1830
01.01.2017
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.44
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Strain in epitaxial high-index Bi2Se3(221) films grown by molecular-beam epitaxy
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