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Combined influence of fluorine doping and vacuum annealing on the electrical properties of ZnO:Ta films
Combined influence of fluorine doping and vacuum annealing on the electrical properties of ZnO:Ta films
Combined influence of fluorine doping and vacuum annealing on the electrical properties of ZnO:Ta films
Subha, K. (Autor:in) / Ravichandran, K. (Autor:in) / Sriram, S. (Autor:in)
Applied surface science ; 409 ; 413-425
01.01.2017
13 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.44
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