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In situ Ni-doping during cathodic electrodeposition of hematite for excellent photoelectrochemical performance of nanostructured nickel oxide-hematite p-n junction photoanode
In situ Ni-doping during cathodic electrodeposition of hematite for excellent photoelectrochemical performance of nanostructured nickel oxide-hematite p-n junction photoanode
In situ Ni-doping during cathodic electrodeposition of hematite for excellent photoelectrochemical performance of nanostructured nickel oxide-hematite p-n junction photoanode
Phuan, Yi Wen (Autor:in) / Ibrahim, Elyas (Autor:in) / Chong, Meng Nan (Autor:in) / Zhu, Tao (Autor:in) / Lee, Byeong-Kyu (Autor:in) / Ocon, Joey D. (Autor:in) / Chan, Eng Seng (Autor:in)
Applied surface science ; 392 ; 144-152
01.01.2017
9 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.44
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