Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Formation of atomically flat hydroxyl-terminated diamond (1 1 1) surfaces via water vapor annealing
Formation of atomically flat hydroxyl-terminated diamond (1 1 1) surfaces via water vapor annealing
Formation of atomically flat hydroxyl-terminated diamond (1 1 1) surfaces via water vapor annealing
Yoshida, Ryo (Autor:in) / Miyata, Daisuke (Autor:in) / Makino, Toshiharu (Autor:in) / Yamasaki, Satoshi (Autor:in) / Matsumoto, Tsubasa (Autor:in) / Inokuma, Takao (Autor:in) / Tokuda, Norio (Autor:in)
Applied surface science ; 458 ; 222-225
01.01.2018
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.44
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Atomic force microscopy study of atomically flat (001) diamond surfaces treated with hydrogen plasma
British Library Online Contents | 1998
|Formation of Graphene onto Atomically Flat 6H-SiC
British Library Online Contents | 2014
|TOF-SIMS study of organosilane adsorption on model hydroxyl terminated surfaces
British Library Online Contents | 2003
|MESFETs and MOSFETs on Hydrogen-Terminated Diamond Surfaces
British Library Online Contents | 1998
|British Library Online Contents | 2008
|