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Synthesis, crystal growth, thermal and laser damage threshold properties of new Schiff base NLO material 4-Nitro-benzoic acid (3-ethoxy-2-hydroxy-benzylidene)-hydrazide
Synthesis, crystal growth, thermal and laser damage threshold properties of new Schiff base NLO material 4-Nitro-benzoic acid (3-ethoxy-2-hydroxy-benzylidene)-hydrazide
Synthesis, crystal growth, thermal and laser damage threshold properties of new Schiff base NLO material 4-Nitro-benzoic acid (3-ethoxy-2-hydroxy-benzylidene)-hydrazide
Shankar, M. (Autor:in) / Dennis Raj, A. (Autor:in) / Jeeva, M. (Autor:in) / Purusothaman, R. (Autor:in) / Vimalan, M. (Autor:in) / Vetha Potheher, I. (Autor:in)
MATERIALS LETTERS ; 232 ; 113-117
01.01.2018
5 pages
Aufsatz (Zeitschrift)
Unbekannt
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N-[Hydroxy(amino)alkyl]amides of Amino(nitro)benzoic Acids
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