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Formation mechanism of inverted pyramid from sub-micro to micro scale on c-Si surface by metal assisted chemical etching temperature
Formation mechanism of inverted pyramid from sub-micro to micro scale on c-Si surface by metal assisted chemical etching temperature
Formation mechanism of inverted pyramid from sub-micro to micro scale on c-Si surface by metal assisted chemical etching temperature
Tang, Quntao (Autor:in) / Shen, Honglie (Autor:in) / Yao, Hanyu (Autor:in) / Jiang, Ye (Autor:in) / Li, Yufang (Autor:in) / Zhang, Lei (Autor:in) / Ni, Zhichun (Autor:in) / Wei, Qingzhu (Autor:in)
Applied surface science ; 455 ; 283-294
01.01.2018
12 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.44
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