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Deuterium retention in tungsten co-deposits with neon and argon inclusions
Deuterium (D) retention in tungsten (W) co-deposited layers, in the presence of neon (Ne) and argon (Ar), was investigated using the bipolar High Power Impulse Magnetron Sputtering (BP-HiPIMS) technique. The deposited layers have a polycrystalline structure, with a preferential growth of W(110) phase. The concentration of D and noble gases (Ne and Ar) is almost constant throughout the depth of the layers. In a D2-Ar discharge, the deposited layers exhibit compressive stress, indicating that Ar is mostly incorporated into the interstitial sites of the W crystal lattice. D retention increases when Ne is added in the discharge, especially when the deposited layer is bombarded with highly energetic ions. Low energy Ne ions (below the W damaging threshold) induce compressive stress, indicating that Ne atoms occupy interstitial sites in the W crystal lattice. High energy Ne ions induce tensile stress, a sign that Ne is trapped in the grain boundaries as inert-gas-vacancy defects, leading to a grain-boundary relaxation. In the presence of Ne, the ion acceleration towards the layer from 0 V to 300 V results in an increase of the D content of about three times, from 3.2 at.% to 8.6 at.%.
Deuterium retention in tungsten co-deposits with neon and argon inclusions
Deuterium (D) retention in tungsten (W) co-deposited layers, in the presence of neon (Ne) and argon (Ar), was investigated using the bipolar High Power Impulse Magnetron Sputtering (BP-HiPIMS) technique. The deposited layers have a polycrystalline structure, with a preferential growth of W(110) phase. The concentration of D and noble gases (Ne and Ar) is almost constant throughout the depth of the layers. In a D2-Ar discharge, the deposited layers exhibit compressive stress, indicating that Ar is mostly incorporated into the interstitial sites of the W crystal lattice. D retention increases when Ne is added in the discharge, especially when the deposited layer is bombarded with highly energetic ions. Low energy Ne ions (below the W damaging threshold) induce compressive stress, indicating that Ne atoms occupy interstitial sites in the W crystal lattice. High energy Ne ions induce tensile stress, a sign that Ne is trapped in the grain boundaries as inert-gas-vacancy defects, leading to a grain-boundary relaxation. In the presence of Ne, the ion acceleration towards the layer from 0 V to 300 V results in an increase of the D content of about three times, from 3.2 at.% to 8.6 at.%.
Deuterium retention in tungsten co-deposits with neon and argon inclusions
V. Tiron (Autor:in) / M.A. Ciolan (Autor:in) / G. Bulai (Autor:in) / I. Burducea (Autor:in) / D. Iancu (Autor:in) / J. Julin (Autor:in) / M. Kivekäs (Autor:in) / C. Costin (Autor:in)
2024
Aufsatz (Zeitschrift)
Elektronische Ressource
Unbekannt
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Deuterium retention in tungsten co-deposits with neon and argon inclusions
| Elsevier | 2024
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