Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Processing technology of siliconized graphite product
The invention discloses a processing technology of a siliconized graphite product. The processing technology of the graphite product comprises the following steps: 1) firstly obtaining a graphite blank having a smooth surface by coarsely processing and fine processing a graphite blank matrix; reserving a processing allowance of 0.05-0.5mm; 2) implementing a graphite siliconization process to the graphite blank by a vacuum gas phase deposition reaction method; forming a siliconized graphite coarse product having a silicon carbide layer on the surface thereof; 3) soaking the siliconized graphite coarse product obtained by the step 2) into a melting sodium hydroxide for removing the free silicon therein; and 4) finally obtaining a required siliconized graphite product by rinsing, drying and machining sequentially. The processing technology of the graphite product employs the gas phase deposition reaction method to implement the silicon carbonization process to the fine processed graphite surface. The surface of the graphite blank is smooth and beneficial to a uniform permeation of the silicon; in the subsequent machining, the damage to the silicon carbide layer formed on the surface is small; the reserved machining allowance is small, thus the subsequent machining is easy, the precision of the siliconized graphite product is easy to control, and the rate of the finished products is higher than 98%.
Processing technology of siliconized graphite product
The invention discloses a processing technology of a siliconized graphite product. The processing technology of the graphite product comprises the following steps: 1) firstly obtaining a graphite blank having a smooth surface by coarsely processing and fine processing a graphite blank matrix; reserving a processing allowance of 0.05-0.5mm; 2) implementing a graphite siliconization process to the graphite blank by a vacuum gas phase deposition reaction method; forming a siliconized graphite coarse product having a silicon carbide layer on the surface thereof; 3) soaking the siliconized graphite coarse product obtained by the step 2) into a melting sodium hydroxide for removing the free silicon therein; and 4) finally obtaining a required siliconized graphite product by rinsing, drying and machining sequentially. The processing technology of the graphite product employs the gas phase deposition reaction method to implement the silicon carbonization process to the fine processed graphite surface. The surface of the graphite blank is smooth and beneficial to a uniform permeation of the silicon; in the subsequent machining, the damage to the silicon carbide layer formed on the surface is small; the reserved machining allowance is small, thus the subsequent machining is easy, the precision of the siliconized graphite product is easy to control, and the rate of the finished products is higher than 98%.
Processing technology of siliconized graphite product
PENG DAHONG (Autor:in)
10.06.2015
Patent
Elektronische Ressource
Englisch
IPC:
C04B
Kalk
,
LIME
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