Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Method for producing nitride phosphor, silicon nitride powder for nitride phosphor, and nitride phosphor
Provided is a nitride phosphor comprising a (Ca, Sr)AlSiN3:Eu phosphor, of which the chemical composition can be controlled readily and which has excellent fluorescent properties. Provided is a method for producing a nitride phosphor represented by the formula: (Ca1-x1-x2Srx1Eux2)aAlbSicN2a/3+b+4/3c (wherein 0.49<=a<=1.1, 0.9<=b<=1.1, 0.9<=c<=1.1). In the method, a silicon nitride powder is used as a raw material, wherein the silicon nitride powder has a specific surface area of 5 to 35 m2/g and also has such a property that the FS/FSO ((m2/g)/(mass%)) ratio is 8 to 53 and the FS/FIO ((m2/g)/(mass%)) ratio is 20 or more in which FSO (mass%) represents the ratio of the amount of oxygen existing in a region between the surface of each particle of the silicon nitride powder and a zone that is 3 nm directly below the surface of the particle to the amount of the silicon nitride powder by mass, FIO (mass%) represents the ratio of the amount of oxygen existing on the inner side of the zone that is 3 nm directly below the surface of the particle to the amount of the silicon nitride powder by mass, and FS (m2/g) represents a specific surface area.
Method for producing nitride phosphor, silicon nitride powder for nitride phosphor, and nitride phosphor
Provided is a nitride phosphor comprising a (Ca, Sr)AlSiN3:Eu phosphor, of which the chemical composition can be controlled readily and which has excellent fluorescent properties. Provided is a method for producing a nitride phosphor represented by the formula: (Ca1-x1-x2Srx1Eux2)aAlbSicN2a/3+b+4/3c (wherein 0.49<=a<=1.1, 0.9<=b<=1.1, 0.9<=c<=1.1). In the method, a silicon nitride powder is used as a raw material, wherein the silicon nitride powder has a specific surface area of 5 to 35 m2/g and also has such a property that the FS/FSO ((m2/g)/(mass%)) ratio is 8 to 53 and the FS/FIO ((m2/g)/(mass%)) ratio is 20 or more in which FSO (mass%) represents the ratio of the amount of oxygen existing in a region between the surface of each particle of the silicon nitride powder and a zone that is 3 nm directly below the surface of the particle to the amount of the silicon nitride powder by mass, FIO (mass%) represents the ratio of the amount of oxygen existing on the inner side of the zone that is 3 nm directly below the surface of the particle to the amount of the silicon nitride powder by mass, and FS (m2/g) represents a specific surface area.
Method for producing nitride phosphor, silicon nitride powder for nitride phosphor, and nitride phosphor
IWASHITA KAZUKI (Autor:in) / SUMINO MAO (Autor:in) / UEDA TAKAYUKI (Autor:in) / FUJINAGA MASATAKA (Autor:in) / JIDA SHINSUKE (Autor:in)
28.10.2015
Patent
Elektronische Ressource
Englisch
Europäisches Patentamt | 2016
|METHOD FOR PRODUCING NITRIDE PHOSPHOR, NITRIDE PHOSPHOR, AND LIGHT-EMITTING DEVICE
Europäisches Patentamt | 2018
|Manufacturing method of nitride phosphor or oxynitride phosphor
Europäisches Patentamt | 2017
|Europäisches Patentamt | 2019
|Europäisches Patentamt | 2021
|