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EITZO target material and preparation method thereof
The invention provides an EITZO target material. The EITZO target material comprises a metal oxide composition, the EITZO target material comprises a metal oxide composition, and the metal oxide composition comprises indium oxide, tin oxide, erbium oxide and zinc oxide. The erbium oxide accounts for 5%-10% of the metal oxide composition. The preparation process of the EITZO target material comprises the following steps of pressing the metal oxide composition into a blank, molding and sintering. According to the EITZO target material, indium oxide, tin oxide, erbium oxide and zinc oxide are matched, and the EITZO target material is obtained through forming and sintering, so that the mobility of the EITZO target material after film coating is remarkably improved, the resolution ratio is improved, and the grain size of the EITZO target material is reduced. According to the EITZO target material disclosed by the invention, on the premise of controlling low cost, the mobility of the EITZO target material after film coating is improved, the resolution ratio is improved, the grain size of the EITZO target material is reduced, and the relative density of the EITZO target material is improved.
本发明提供了一种EITZO靶材,所述EITZO靶材包括氧化金属组合物,所述EITZO靶材包括氧化金属组合物,所述氧化金属组合物包括以组分:氧化铟、氧化锡、氧化铒和氧化锌;所述氧化铒占所述氧化金属组合物的5%~10%;所述EITZO靶材的制备过程包括:将所述氧化金属组合物压胚成型后烧结。本发明的EITZO靶材将氧化铟、氧化锡、氧化铒和氧化锌搭配,经成型烧结得到EITZO靶材显著的提高了EITZO靶材镀膜后的迁移率,提高了分辨率,并且降低了EITZO靶材的晶粒尺寸。本发明的EITZO靶材在控制低成本的前提下提高了EITZO靶材镀膜后的迁移率,提高了分辨率,并且降低了EITZO靶材的晶粒尺寸,提高了EITZO靶材的相对密度。
EITZO target material and preparation method thereof
The invention provides an EITZO target material. The EITZO target material comprises a metal oxide composition, the EITZO target material comprises a metal oxide composition, and the metal oxide composition comprises indium oxide, tin oxide, erbium oxide and zinc oxide. The erbium oxide accounts for 5%-10% of the metal oxide composition. The preparation process of the EITZO target material comprises the following steps of pressing the metal oxide composition into a blank, molding and sintering. According to the EITZO target material, indium oxide, tin oxide, erbium oxide and zinc oxide are matched, and the EITZO target material is obtained through forming and sintering, so that the mobility of the EITZO target material after film coating is remarkably improved, the resolution ratio is improved, and the grain size of the EITZO target material is reduced. According to the EITZO target material disclosed by the invention, on the premise of controlling low cost, the mobility of the EITZO target material after film coating is improved, the resolution ratio is improved, the grain size of the EITZO target material is reduced, and the relative density of the EITZO target material is improved.
本发明提供了一种EITZO靶材,所述EITZO靶材包括氧化金属组合物,所述EITZO靶材包括氧化金属组合物,所述氧化金属组合物包括以组分:氧化铟、氧化锡、氧化铒和氧化锌;所述氧化铒占所述氧化金属组合物的5%~10%;所述EITZO靶材的制备过程包括:将所述氧化金属组合物压胚成型后烧结。本发明的EITZO靶材将氧化铟、氧化锡、氧化铒和氧化锌搭配,经成型烧结得到EITZO靶材显著的提高了EITZO靶材镀膜后的迁移率,提高了分辨率,并且降低了EITZO靶材的晶粒尺寸。本发明的EITZO靶材在控制低成本的前提下提高了EITZO靶材镀膜后的迁移率,提高了分辨率,并且降低了EITZO靶材的晶粒尺寸,提高了EITZO靶材的相对密度。
EITZO target material and preparation method thereof
一种EITZO靶材及其制备方法
LIU WENJIE (Autor:in) / ZHONG XIAOHUA (Autor:in) / TONG PEIYUN (Autor:in) / ZHU LIU (Autor:in)
26.01.2021
Patent
Elektronische Ressource
Chinesisch